[20a-A202-1~9] 17.3 Layered materials

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[20a-A202-3] Crystallinity of MoS₂ film deposited by RF magnetron sputtering on underlying layer material

〇Naoki Matsunaga¹, Shinya Imai¹, Hitoshi Wakabayashi¹ (1.Tokyo Tech)

Keywords:

transition metal dichalcogenides,RF Magnetron Sputtering,Underlying layer material

RF magnetron sputtering is a promising method for industrial applications requiring large-area uniform deposition of transition metal dichalcogenides (TMDCs). Optical and electrical properties of MoS₂ films have been reported to be affected by the underlying material of deposition. In this study, we focus on the thickness and type of the substrate material and evaluate how they affect the crystallinity of the sputtered MoS₂ films.