Session Details
[20a-A202-1~9]17.3 Layered materials
Wed. Sep 20, 2023 9:30 AM - 12:00 PM JST
Wed. Sep 20, 2023 12:30 AM - 3:00 AM UTC
Wed. Sep 20, 2023 12:30 AM - 3:00 AM UTC
A202 (KJ Hall)
Ryo Kitaura(NIMS)
[20a-A202-1]Thermal stability of Janus TMD monolayers revealed by in-situ monitoring plasma atomic functionalization
〇Hiroto Ogura1, Hiroshi Nakajo1,2, Soma Aoki1, Toshiaki Kato1 (1.Tohoku Univ., 2.KOKUSAI ELECTRIC Corp.)
[20a-A202-2]Atomic-resolution electron microscopy of sputter-deposited MoS2 on substrate
〇(M2)Takashi Takeda1, Ryo Ono2, Yuta Kusama1, Emi Kano1, Iriya Muneta2, Hitoshi Wakabayashi2, Nobuyuki Ikarashi1 (1.Nagoya Univ., 2.Tokyo Tech.)
[20a-A202-3]Crystallinity of MoS2 film deposited by RF magnetron sputtering on underlying layer material
〇Naoki Matsunaga1, Shinya Imai1, Hitoshi Wakabayashi1 (1.Tokyo Tech)
[20a-A202-4]Development of atomic layer etching method for WTe2 single crystals
〇Manabu Ohtomo1, Naoki Fushimi1, Masayuki Hosoda1,2, Junichi Yamaguchi1, Russell Deacon2, Michael Randle2, Kenichi Kawaguchi1, Koji Ishibashi2, Shintaro Sato1 (1.Fujitsu Ltd., 2.RIKEN)
[20a-A202-5]Fabrication and Characterizations of Janus MoSSe Nanoscrolls
〇Masahiko Kaneda1, Wenjin Zhang1, Zheng Liu2, Yanlin Gao3, Mina Maruyama3, Yusuke Nakanishi1, Hiroshi Nakajo4,5,6, Soma Aoki4,5, Kota Honda7, Tomoya Ogawa1, Kazuki Hashimoto1, Takahiko Endo1, Kohei Aso8, Tongmin Chen8, Yoshifumi Oshima8, Yukiko Yamada-Takamura8, Yasufumi Takahashi7,9, Susumu Okada3, Toshiaki Kato4,5, Yasumitsu Miyata1 (1.Tokyo Metro. Univ., 2.AIST, 3.Tsukuba univ, 4.Tohoku univ, 5.AIMR Tohoku univ, 6.KOKUSAI ELECTRIC CORP, 7.Nagoya Univ., 8.JAIST, 9.Kanazawa univ.)
[20a-A202-6]Low temperature scanning tunneling microscopy observation of segregated germanene on Ag thin film
〇daiki katsube1, Yuki Fukaya2, Tomo-o Terasawa2, Masahiro Yano2, Yousoo Kim1, Junji Yuhara3, Seiya Suzuki2 (1.RIKEN, 2.JAEA, 3.Nagoya Univ.)
[20a-A202-7]van der Waals stacking of atomic layers for direct imaging of moiré superlattices
〇(M1)Jimpei Kawase1, Yuta Seo1, Momoko Onodera1, Kei Kinoshita1, Seong-Oh Kim2, Chie Goto3, Xiaowei Tian3, Yung-Chang Lin4, Kazutomo Suenaga4,5, Kenji Watanabe6, Takashi Taniguchi6, Rai Moriya1, Tomoki Machida1 (1.IIS Univ. Tokyo, 2.Park Systems Corp., 3.Parksystems. Japan, 4.AIST, 5.SANKEN Osaka Univ., 6.NIMS)
[20a-A202-8]Symmetry engineering of WTe2 using twisted van der Waals assembly
〇Yijin Zhang1, Keisuke Kamiya1, Takato Yamamoto2, Masato Sakano2, Xiaohan Yang1, Satoru Masubuchi1, Shota Okazaki4, Keisuke Shinokita3, Kenji Watanabe5, Takashi Taniguchi5, Kazunari Matsuda3, Takao Sasagawa4, Kyoko Ishizaka2,6, Tomoki Machida1 (1.IIS Univ. Tokyo, 2.Univ. Tokyo, 3.IAE Kyoto Univ., 4.MSL Tokyo Tech., 5.NIMS, 6.CEMS RIKEN)
[20a-A202-9]Thickness identification of MXene thin flake by optical imaging
〇Yasuyuki Sainoo1, Md Nasiruddin2, Tsuyoshi Takaoka1, Saidur Rahman3, Tadahiro Komeda1,2 (1.IRAM, Tohoku Univ., 2.Chem, Tohoku Univ., 3.Sunway University,)