[20a-A301-1~11] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)

[20a-A301-8] Investigation of the scale-down effect of various resources in Minimal Fab

〇Tatsuya Fujita¹, Takashi Yajima², Kazumasa Nemoto³, Fumito Imura¹, Shiro Hara^1,2,3 (1.Hundred Semiconductors, 2.MINIMAL, 3.AIST)

Keywords:

Minimal Fab