Presentation Information
[20a-A501-1]Field Distortions of Stereophonic Projection Lithography Using Parabolic Mirrors and Their Influences on Patterning Characteristics
〇Toshiyuki Horiuchi1, Jun-ya Iwasaki1, Hiroshi Kobayashi1 (1.Tokyo Denki Univ.)
Keywords:
stereophonic lithography,parabolic mirror,field distortion
In the research on stereophonic projection lithography using parabolic mirrors, the reticle placed in the lower mirror aperture was illuminated obliquely upward from only one side by a collimated LED light with a wavelength of 405 nm. Because, by the measures, image contrasts and patterning area sizes were greatly improved. However, the image field was noticeably distorted especially at outside parts. For this reason, image field distortions were investigated by some experiments and ray trace calculations in detail. As a result, characteristics of the field distortion were almost grasped. The distortions were reflected to the pattern width distribution in the field. It was clarified that the influence of the field distortions on pattern size distribution should be considered carefully.