Session Details

[20a-A501-1~8]7.3 Micro/Nano patterning and fabrication

Wed. Sep 20, 2023 9:00 AM - 11:15 AM JST
Wed. Sep 20, 2023 12:00 AM - 2:15 AM UTC
A501 (KJ Hall)
Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.)

[20a-A501-1]Field Distortions of Stereophonic Projection Lithography Using Parabolic Mirrors and Their Influences on Patterning Characteristics

〇Toshiyuki Horiuchi1, Jun-ya Iwasaki1, Hiroshi Kobayashi1 (1.Tokyo Denki Univ.)

[20a-A501-2]Fundamental study on lithographic characteristics of metal resists for photo- and electron beam lithography

〇Hiroki Yamamoto1, Takahiro Kozawa2 (1.QST, 2.SANKEN,Osaka Univ.)

[20a-A501-3]Formation of Silicone Microcup Array Structures with Entrapped Ionic Liquids

〇Masayuki Okoshi1, Kaede Iwasaki1 (1.NDA)

[20a-A501-4]Relationship between number of ion irradiations and
morphology of surface structures on SiC substrate

〇Kenichiro Yoshiura1, Naoto Oishi1, Noriko Nitta1 (1.Kochi Univ of Technology)

[20a-A501-5]Molecular dynamics study of early stages of development process for negative type resists in electron beam lithography

〇(M1)Ryuki Tanaka1, Kaito Ymada1, Masaaki Yasuda1 (1.Osaka Metropolitan Univ.)

[20a-A501-6]Non-residual-layer nanoimprint using silver ink without vacuum process

〇Yuri Nakamura1, Jun Taniguchi1 (1.Tokyo Univ. of Sci.)

[20a-A501-7]Nano-Periodic Pattern Formation on polylactic acid sheets by thermal nanoimprinting

〇Ryuka Umemoto1, Yuta Kitamura1, Satoru Kaneko2,1, Mamoru Yoshimoto1, Akifumi Matsuda1 (1.Tokyo Tech, 2.KISTEC)

[20a-A501-8]The method to create a stencil mask using a bridge structure

〇Hibiki Tamura1, Yusuke Murakami1, Jun Taniguchi1 (1.Tokyo Univ. of Science)