Presentation Information
[20a-A501-2]Fundamental study on lithographic characteristics of metal resists for photo- and electron beam lithography
〇Hiroki Yamamoto1, Takahiro Kozawa2 (1.QST, 2.SANKEN,Osaka Univ.)
Keywords:
metal resist,photolithography,dissolution behavior
Some hybrid metal resist materials were synthesized and lithographic characteristics of them were investigated. Our results indicated that the solubility of metal resists decreased by the exposure to KrF, ArF and EB. The sensitivity in Ti-based metal resists was higher than that of Zr-based metal resists in both KrF and ArF exposure. Also, the dissolution behaviors of metal resists were investigated by development analyzer. The dissolution rate was same in both KrF and ArF exposure. The dissolution contrast of Ti-based metal resists was higher compared to Zr-based metal resists. Metal resists have the potential as future negative tone photoresist and EB resist materials.