Presentation Information
[20a-A501-6]Non-residual-layer nanoimprint using silver ink without vacuum process
〇Yuri Nakamura1, Jun Taniguchi1 (1.Tokyo Univ. of Sci.)
Keywords:
nanoimprint,Non-residual-layer,silver ink
During nanoimprint lithography, an unnecessary resin layer called a residual layer is generated at the bottom of the imprinted pattern. Reactive ion etching has been proposed to remove the residual film, and vacuum deposition of UV light shielding material on the convex projections has been proposed to prevent the formation of residual film, but the vacuum process is time-consuming. In this experiment, we attempted pattern formation without residual film by bonding UV light shielding material in air. This method is expected to improve throughput and has the advantage of not requiring consideration of non-uniformity in the removal of residual film.