Presentation Information

11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)

[20a-A501-8]The method to create a stencil mask using a bridge structure

〇Hibiki Tamura¹, Yusuke Murakami¹, Jun Taniguchi¹ (1.Tokyo Univ. of Science)

Keywords:

nanoimprint lithography,photomask,bridge structure

Considering that photomasks of 1 μm or less are required for further miniaturization of photomasks used in semiconductor processes, we have tried various methods. The results of an attempt to apply a positive PMMA resist on top of this are shown.

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