[20p-A202-1~11] Interfacial Nano Electrochemistry: Deepening semiconductor wet processing

1:30 PM - 2:00 PM JST(4:30 AM - 5:00 AM UTC)

[20p-A202-2] Development of Single-Wafer Cleaning Tool for Semiconductor Manufacturing

〇Itaru Kanno¹ (1.Tokyo Electron Kyushu)

Keywords:

cleaning,single-wafer,semiconductor

半導体製造における枚葉洗浄装置の利点や課題、今後の展望について述べる。