The 84th JSAP Autumn Meeting 2023
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Session Details

Symposium (Oral)Symposium : Interfacial Nano Electrochemistry: Deepening semiconductor wet processing

[20p-A202-1~11]Interfacial Nano Electrochemistry: Deepening semiconductor wet processing

Wed. Sep 20, 2023 1:00 PM - 5:00 PM JST
Wed. Sep 20, 2023 4:00 AM - 8:00 AM UTC
A202 (KJ Hall)
Toshiyuki Sanada(Shizuoka Univ.), Yasuhito Yoshimizu(Toshiba Memory)
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シンポジウムスポンサー
 
1:00 PM - 1:30 PM JST(4:00 AM - 4:30 AM UTC)

[20p-A202-1]History and innovation of semiconductor cleaning equipment

〇Hiroyuki Araki1 (1.SCREEN)
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1:30 PM - 2:00 PM JST(4:30 AM - 5:00 AM UTC)

[20p-A202-2]Development of Single-Wafer Cleaning Tool for Semiconductor Manufacturing

〇Itaru Kanno1 (1.Tokyo Electron Kyushu)
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2:00 PM - 2:15 PM JST(5:00 AM - 5:15 AM UTC)

[20p-A202-3]Analysis of surface behavior in Si etching process with the HF/HNO3 mixture by single spin wafer processor

〇Kenya Nishio1, Tomoki Hirano1, Takashi Oinoue1, Suguru Saito1, Yoshiya Hagimoto1, Hayato Iwamoto1 (1.Sony Semiconductor Solutions Corp.)
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2:15 PM - 2:30 PM JST(5:15 AM - 5:30 AM UTC)

[20p-A202-4]Numerical Computation of Liquid Film Flows with Wet Chemical Etching on a Rotating Disk using OpenFOAM

〇Yoshinori Jinbo1, Masanobu Sato2, Toshiyuki Sanada1 (1.Shizuoka Univ., 2.SCREEN Semiconductor Solutions Co., Ltd.)
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2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)

[20p-A202-5]Theoretical Analysis of Etching -First-Principles and Machine Learning Calculations-

〇Kohji Inagaki1, Kenta Arima1 (1.Osaka Univ.)
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2:45 PM - 3:00 PM JST(5:45 AM - 6:00 AM UTC)

[20p-A202-6]Removal of the absorption loss for nanocavity-based Raman silicon laser fabricated by CMOS-compatible process

〇Yasushi Takahashi1, Yu Shimomura1, Makoto Okano2 (1.Osaka Met. Univ., 2.AIST)
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3:15 PM - 3:45 PM JST(6:15 AM - 6:45 AM UTC)

[20p-A202-7]30 Years of Semiconductor Cleaning Technology and Future Prospects

〇Hiroshi Tomita1 (1.KIOXIA)
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3:45 PM - 4:15 PM JST(6:45 AM - 7:15 AM UTC)

[20p-A202-8]Viewpoint of Analysis and Design for Water Flow in Batch-Type Wafer Wet Cleaning Bath

〇Hitoshi Habuka1 (1.Yokohama Nat. Univ.)
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4:15 PM - 4:30 PM JST(7:15 AM - 7:30 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[20p-A202-9]Observation of absorption and desorption due to volume change of PVA brushes

〇Shota Suzuki1, Yuki Mizushima1, Satomi Hamada2, Ryota Koshino2, Toshiyuki Sanada1 (1.Shizuoka Univ., 2.Ebara Corp.)
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4:30 PM - 4:45 PM JST(7:30 AM - 7:45 AM UTC)

[20p-A202-10]Controlling the Generated Charge During Two-fluid Spraying Using an Inductive Charging Element

〇Yoshiyuki Seike1, Hiroharu Suzuki1, Yusuke Ichino1, Noriyuki Taoka1, Tatsuo Mori1 (1.Aichi Inst. of Technol.)
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4:45 PM - 5:00 PM JST(7:45 AM - 8:00 AM UTC)

[20p-A202-11]The activities of the working group on adsorption phenomena organized by the Professional Group of Interfacial Nano Electrochemistry

〇Yasuhito Yoshimizu1 (1.KIOXIA Corp.)
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