[20p-A202-1~11] Interfacial Nano Electrochemistry: Deepening semiconductor wet processing

3:45 PM - 4:15 PM JST(6:45 AM - 7:15 AM UTC)

[20p-A202-8] Viewpoint of Analysis and Design for Water Flow in Batch-Type Wafer Wet Cleaning Bath

〇Hitoshi Habuka¹ (1.Yokohama Nat. Univ.)

Keywords:

Wafer cleaning,water flow,design

In this paper, viewpoints of an analysis and a design for the large diameter silicon wafer wet cleaning bath will be discussed. The batch-type bath has huge water recirculation which might delay the water replacement and cause the cross-contaminations. Thus, an overall water flow was observed. Next, the water motions were analyzed and designed by means of the computational fluid dynamics.