[20p-A309-1~19] 6.1 Ferroelectric thin films

1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)

[20p-A309-3] Observation of ferroelectric domain and its temperature dependence of ferroelectric HfO₂ using laser-photoelectron emission microscopy

〇(D)Yuki Itoya¹, Hirokazu Fujiwara², Cedric Bareille^3,4, Shik Shin^4,5, Toshiyuki Taniuchi^3,4, Masaharu Kobayashi^1,6 (1.Univ. Tokyo IIS, 2.ISSP, 3.GSFS, 4.MIRC, 5.Univ. of Tokyo, 6.d. lab)

Keywords:

Ferroelectric

We fabricated HfO₂-based ferroelectric thin films and observed the temperature dependence of the in-plane distribution of ferroelectric polarization domains by repeatedly acquiring PEEM images and heating the films with in-situ observation. This observation showed that the contrast of ferroelectric polarization domains decreases as the temperature approaches the Curie temperature. In addition, an in-plane distribution of the amount of contrast decrease was observed. This result suggests that there is a micron-scale in-plane distribution of the Curie temperature.