Presentation Information

[20p-B101-1]Growth of Cu3N Films by Mist CVD with Ethylenediamine

〇(M2)Shogo Yoshida1, Kazuyo Omura2, Hiroki Nagai1, Takeyoshi Onuma1, Tomohiro Yamaguchi1, Naoya Masahashi2, Tohru Honda1 (1.Kogakuin Univ., 2.IMR, Tohoku Univ.)

Keywords:

Copper nitride,Mist chemical vapor deposition