[21a-A302-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[21a-A302-9] Control of hydrogenated amorphous carbon film properties by tailored voltage waveform discharges

〇Michihiro Otaka¹, Hiroshi Otomo^1,2, Kizuki Ikeda¹, Jiansyun Lai¹, Daichi Wakita¹, Kunihiro Kamataki¹, Naoto Yamashita¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹, Takahiro Shindo², Satoshi Tanaka², Tatsuo Matsudo² (1.Kyushu Univ., 2.Tokyo Electron Technology Solutions)

Keywords:

Tailored Voltage Waveforms,Hydrogenated amorphous carbon film,Plasma Enhanced Chemical Vapor Deposition

Independent control of ion bombardment energy and ion flux is important for PECVD. Therefore, Tailored Voltage Waveforms (TVWs) discharges are suggested. TVWs is synthesized, for instance, by phase-locked fundamental waveform and its second harmonic. However, rather few reports of thin film deposition using TVW discharges have been published. In this study, we have investigated effects of TVW discharges on deposition of a-C:H films by CH₄/Ar CCP.