Presentation Information
[21a-P06-9]Evaluation of the Al2O3/GaN interface after PMA treatment by photoelectron holography
〇Hazuki Natsui1, Mutsunori Uenuma1,2, Hiroto Tomita1, Yusuke Hashimoto1, Tomohiro Matsushita1, Mami N.Fujii3, Yukiharu Uraoka1 (1.NAIST, 2.AIST, 3.Kindai Univ.)
Keywords:
power device,GaN