Presentation Information

[21a-P06-9]Evaluation of the Al2O3/GaN interface after PMA treatment by photoelectron holography

〇Hazuki Natsui1, Mutsunori Uenuma1,2, Hiroto Tomita1, Yusuke Hashimoto1, Tomohiro Matsushita1, Mami N.Fujii3, Yukiharu Uraoka1 (1.NAIST, 2.AIST, 3.Kindai Univ.)

Keywords:

power device,GaN