Presentation Information
[21p-A302-1]Preparation of AlCrN Films by DC Vacuum Arc Deposition System with a Coiled Anode
〇jumpei kito1, Takahiro Bando1, Toru Harigai1, Hirofumi Takikawa1, Hiroaki Sugita2, Takahiro Hattori2, Hiroki Gima2 (1.Toyohashi Univ. Technol, 2.OSG Co., Ltd)
Keywords:
AlCrN,Vacuum arc deposition,Coiled anode
We have developed a High rete FAD (HR-FAD) method that improves plasma transport efficiency by using a coiled anode that generates a self-magnetic field, and applied it to TiN films to clarify its effectiveness.
In this study, HR-FAD was applied to the preparation of AlCrN films. First, the film aspect at the cathode-substrate distance, especially the film thickness and droplet adhesion, were investigated. The film thickness after deposition was the largest in front of the cathode with the longest cathode-substrate distance, confirming highly efficient plasma transport.
In this study, HR-FAD was applied to the preparation of AlCrN films. First, the film aspect at the cathode-substrate distance, especially the film thickness and droplet adhesion, were investigated. The film thickness after deposition was the largest in front of the cathode with the longest cathode-substrate distance, confirming highly efficient plasma transport.