[21p-C402-1~16] 6.2 Carbon-based thin films

2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)

[21p-C402-5] The effect of activation annealing time on the electrical properties of B-implanted type IIa CVD diamonds

〇Yuhei Seki¹, Rintaro Kurashima¹, Minami Yoshihara¹, Yasushi Hoshino¹ (1.Kanagawa Univ.)

Keywords:

Ion implantation,Hall effect,Diamond semiconductor