Presentation Information
[21p-P02-5]Fabrication of Copper-oxide Films by Glancing-angle Reactive Sputtering
〇Yamato Sakamoto1, Oikawa Daichi1, Inoue Yasushi1, Takai Osamu2 (1.Chiba Inst. Technol, 2.Kanto Gakuin Univ)
Keywords:
Discrete Columnar Structure,oblique incidence deposition,copper oxide
In this study, copper oxide thin films, which have been reported to exhibit p-type semiconductor characteristics, were prepared using an RF magnetron sputtering system to investigate whether the AiEC phenomenon occurs.
The GLAD film exhibited a much larger color change than the Normal film, and the GLAD film showed a much larger color change than the Normal film.
The GLAD film exhibited a much larger color change than the Normal film, and the GLAD film showed a much larger color change than the Normal film.