Session Details
[21p-P02-1~6]8.3 Plasma nanotechnology
Thu. Sep 21, 2023 1:30 PM - 3:30 PM JST
Thu. Sep 21, 2023 4:30 AM - 6:30 AM UTC
Thu. Sep 21, 2023 4:30 AM - 6:30 AM UTC
P02 (KJ Hall)
[21p-P02-1]Deposition of RF sputtered SiGe composite films and their application to high-capacity Li ion battery anodes
〇Tomohisa Nakada1, Ryo Hanai1, Kodai Masumoto1, Masayuki Ishihara1, Tomoki Omae1, Reon Yokoi1, Ryoto Niwa1, Giichiro Uchida1 (1.Meijo Univ.)
[21p-P02-2]Development of high-capacity Li ion battery using Si nanoparticles/C-particles hybrid porous film as anode
〇Masayuki Ishihara1, Ryo Hanai1, Kodai Masumoto1, Tomoki Omae1, Tomohisa Nakada1, Ryoto Niwa1, Reon Yokoi1, Giichiro Uchida1 (1.Meijo Univ.)
[21p-P02-3]Effects of Nanoparticles Deposited in Interface Layer on Delamination and Strength of Sandwich-Structured a-C:H Fims
〇(M2)Shinjiro Ono1, Manato Eri1, Takamasa Okumura1, Kunihiro Kamataki1, Naoto Yamashita1, Haruki Kiyama1, Naho Itagaki1, Kazunori Koga1, Masaharu Shiratani1 (1.Kyushu Univ.)
[21p-P02-4]Effect of Ar partial pressure on chemical bonding states of SiO:CH films deposited from TMVS
〇Yuki Nakaizumi1, Yasushi Inoue1, Osamu Takai2 (1.Chiba Inst. Technol., 2.Kanto Gakuin Univ.)
[21p-P02-5]Fabrication of Copper-oxide Films by Glancing-angle Reactive Sputtering
〇Yamato Sakamoto1, Oikawa Daichi1, Inoue Yasushi1, Takai Osamu2 (1.Chiba Inst. Technol, 2.Kanto Gakuin Univ)
[21p-P02-6]Fabrication of SnO2 Thin Films with Isolated Nanocolumnar Structure by Glancing-angle Sputtering
〇Yuma Kameda1, Yasushi Inoue1, Osamu Takai2 (1.Chiba Inst. Technol., 2.Kanto Gakuin Univ.)