[21p-P02-1~6] 8.3 Plasma nanotechnology

[21p-P02-6] Fabrication of SnO₂ Thin Films with Isolated Nanocolumnar Structure by Glancing-angle Sputtering

〇Yuma Kameda¹, Yasushi Inoue¹, Osamu Takai² (1.Chiba Inst. Technol., 2.Kanto Gakuin Univ.)

Keywords:

Sputtering method,SnO2,Glancing-angle deposition

SnO₂ is often used as a gas sensor material. In this study, we aimed to fabricate SnO₂ thin films with a discrete columnar structure by using a grazing incidence deposition sputtering method, in which the substrate is placed at an angle to the target and heated during deposition. The pressure during deposition was adjusted to 2.0 Pa or 10.0 Pa, and the substrate temperature was controlled by a lamp heater during the deposition.