[21p-P09-1~30] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[21p-P09-25] Fabrication of ZnO films by Solid Phase Crystallization of ZnON films for Seed Layers of Transparent Conducting Oxides: Effects of crystallization degree of ZnON films

〇Yoshiharu Wada¹, Zhien Shen¹, Yabuta Hisato¹, Yamashita Naoto¹, Okumura Takamasa¹, Kamataki Kunihiro¹, Koga Kazunori¹, Shiratani Masaharu¹, Itagaki Naho¹ (1.Kyushu-University)

Keywords:

transparent conductive oxide,ZnO,sputtering