[21p-P09-1~30] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[21p-P09-3] Low-temperature deposition of crystalline zinc oxide film using high-power pulsed magnetron sputtering

〇(M2)Katsunori Nagahashi¹, Takayuki Ohta¹ (1.Meijo Univ.)

Keywords:

Zinc Oxide,High Power Pulsed Magnetron Sputtering(HPPMS)