Presentation Information

[22a-A401-5]Etching reactions of W substrate by CF3+ ion injections

〇Shunta Kawabata1, Tomoko Ito1, Song-Yun Kang2, Jiwon Son2, Dongkyu Lee2, Kazuhiro Karahashi1, Satoshi Hamaguchi1 (1.Osaka Univ., 2.Samsung Electronics)

Keywords:

High Aspect Ratio Etching,Ion beam