[22a-A401-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

10:15 AM - 10:30 AM JST(1:15 AM - 1:30 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[22a-A401-6] Electrode material dependence of negative ions in capacitively coupled pulsed plasma

〇(M2)Kazuki Toji¹, Takayoshi Tsutsumi², Shih-Nan Hsiao², Makoto Sekine², Kenji Ishikawa², Masaru Hori² (1.Nagoya Univ., Eng., 2.Center for Low-temperature Plasma Sciences, Nagoya Univ.)

Keywords:

pulsed plasma,negative ions