[22p-P01-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[22p-P01-1] Effect of Plasma Assistance with Nitrogen-Hydrogen Gas Mixtures on Synthesis of Zinc Oxide Thin Films by Mist CVD

〇Yuzuki Moro¹, Keigo Takeda¹, Mineo Hiramatsu¹ (1.Meijo Univ.)

Keywords:

Mist CVD,ZnO,Atmospheric pressure plasma

In this study, we aimed to clarify the effects of atmospheric pressure plasma on the film formation mechanism in mist chemical vapor deposition (CVD). We synthesized ZnO thin films using atmospheric pressure plasma-assisted mist CVD with a mixture of hydrogen-nitrogen gas. The synthesized ZnO films were characterized through surface and cross-sectional observations using SEM,compositional analysis using EDX, and defect evaluation through photoluminescence (PL) measurements. From the obtained PL spectra, we confirmed a reduction in the defect density of the thin films due to the supportive effect of hydrogen-nitrogen gas plasma.