[22p-P01-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[22p-P01-9] Plasma impedance monitoring system externally installed in plasma process equipment

〇Yuji Kasashima¹, Shinji Kuniie², Toshiyuki Sayama² (1.AIST, 2.Advantest)

Keywords:

plasma impedance,plasma etching equipment,in situ monitoring