Presentation Information
[22p-P03-1]Ultra-thin GeSn formation using segregation by Al/epitaxial GeSn(111) structure
〇Taiga Matsumoto1, Shigehisa Shibayama1, Akio Ohta2, Ryo Yokogawa3,4, Masashi Kurosawa1, Mitsuo Sakashita1, Osamu Nakatsuka1 (1.Nagoya Univ., 2.Fukuoka Univ., 3.Meiji Univ., 4.MREL)
Keywords:
segregation,GeSn,Ultra-thin film