Presentation Information
[22p-P08-2]Photoresist removal using highly concentrated ozone water
〇Toshinori Miura1, Naoki Kato1, Akitoshi Nakagawa1, Satoru Seike1 (1.Meidensha Corp.)
Keywords:
ozonated water,resist removal
Ozonated water is being studied as an alternative to harmful chemicals such as sulfuric acid and hydrogen peroxide that are widely used in the cleaning process of semiconductor manufacturing. We are developing an ultra-high concentration ozone water generator exceeding 400ppm using about 100% high concentration and high purity ozone gas (hereinafter referred to as pure ozone gas) obtained from Meidensha Pure Ozone Generator (hereinafter referred to as POG). This time, in order to investigate the effect, we report that the obtained ozone water was applied to the removal of the photoresist used in the semiconductor lithography process.