[23a-A303-1~11] 13.3 Insulator technology

10:15 AM - 10:30 AM JST(1:15 AM - 1:30 AM UTC)

[23a-A303-4] Statistical Measurement of HfOx Film Resistance Change Using Resistance Measurement Platform

〇(M2)Hidemi Mitsuda¹, Tatsuhiko Suzuki¹, Koga Saito¹, Takezo Mawaki^1,2, Shigetoshi Sugawa², Rihito Kuroda^1,2 (1.Tohoku Univ., 2.NICHe Tohoku Univ.)

Keywords:

semiconductor,HfOx filmtei,resistance change

We reports on the statistical measurement of HfOx film resistance change using resistance measurement platform. The resistance measurement platform is a measurement technology that can statistically evaluate the resistance of various materials with high speed and high accuracy by forming a large number of DUTs (Device Under Test) in a two-dimensional array using an array test circuit that can form memory materials with a simple additional process. In this report, we report on the statistical measurement of HfOx film resistance change by forming HfOx film on the platform.