Presentation Information
[23p-A301-10]Negative ion emission from sputtering targets: Al-doped ZnO vs. copper
〇Yoshinobu Matsuda1, Seiichi Hayakawa1, Yosuke Kanahori1, Tamiko Oshima1 (1.Nagasaki Univ.)
Keywords:
RFEA,negative ion,zinc oxide
The energy distribution function (EDF) of substrate incident negative ions was measured using a magnetization reflection field energy analyzer (RFEA) at the area opposite the target erosion region of a DC magnetron discharge in pure Ar at a pressure of 1 Pa.
A high-energy component corresponding to the target applied voltage can be observed for the Al-doped ZnO target, but no high-energy component can be observed for the Cu target. This indicates that the high-energy component obtained in the Al-doped ZnO target is due to oxygen negative ions.
A high-energy component corresponding to the target applied voltage can be observed for the Al-doped ZnO target, but no high-energy component can be observed for the Cu target. This indicates that the high-energy component obtained in the Al-doped ZnO target is due to oxygen negative ions.