Session Details
[23p-A301-1~14]8.1 Plasma production and diagnostics
Sat. Sep 23, 2023 1:00 PM - 4:45 PM JST
Sat. Sep 23, 2023 4:00 AM - 7:45 AM UTC
Sat. Sep 23, 2023 4:00 AM - 7:45 AM UTC
A301 (KJ Hall)
Keigo Takeda(Meijo Univ.), Yoshinobu Matsuda(Nagasaki Univ.)
[23p-A301-1]Investigation of resonator effect on curling probe to be embedded into an electrode
〇(M2)Yuki Kihira1, Keiji Nakamura1, Daisuke Ogawa1 (1.Chubu Univ.)
[23p-A301-2]Antenna Design Optimization of Curling Probes for Electron Density in Plasma
〇(M2)Shota Kato1, Keiji Nakamura1, Daisuke Ogawa1 (1.Chubu Univ.)
[23p-A301-3]Influence of reflected light from the chamber inner wall upon electron temperature and density in plasma diagnostics by tomographic optical emission spectroscopic measurement
〇(DC)Yuya Yamashita1,2, Kenta Doi3, Tetsuji Kiyota3, Wataru Kikuchi1, Kenta Ishi1, Shuhei Watanabe1, Atsushi Nezu1, Hiroshi Akatsuka1 (1.Tokyo Tech, 2.JSPS DC, 3.ULVAC)
[23p-A301-4]Diagnostics of Ion Sheath on an AC-Biased Metal Plate Using Time-Resolved Laser-Induced Fluorescence Spectroscopy
〇(M2)Ryosuke Takahashi1, Seiya Kito1, Koji Eriguchi1, Keiichiro Urabe1 (1.Kyoto Univ.)
[23p-A301-5]Real-time measurement of silicon wafer surface temperature during plasma process using Optical-Interference Contactless Thermometry(OICT)
〇Ryunosuke Goto1, Hiroaki Hanafusa1, Seiichiro Higashi1 (1.Graduate School of Advanced Science and Engineering, Hiroshima University)
[23p-A301-6]Development of harmonic spectroscopy method to analyze electric circuit including non-linear resistance and its application to measure plasma and surface parameters
〇Junki Morozumi1, Koji Eriguchi1, Keiichiro Urabe1 (1.Kyoto Univ.)
[23p-A301-7]Relationship between nitrogen atom density and ammonia production rate
in N2/H2 low-pressure miniature ECR plasma
〇(M2)Shogo Uebayashi1, Koichi Sasaki1 (1.Hokkaido Univ.)
[23p-A301-8]Analysis of optically-emitting delay times in deep oscillation magnetron sputtering by time-resolved optical emission spectroscopy
〇Eisuke Yokoyama1, Kaede Horiuchi1, Yusei Takahashi1, Yuki Nakagawa1, Nobuo Nishimiya1, Masaomi Sanekata1, Masahide Tona2, Hiroaki Yamamoto2, Keizo Tsukamoto2, Kiyokazu Fuke3, Keijiro Ohshimo4, Fuminori Misaizu4 (1.Tokyo Polytech. Univ., 2.Ayabo Corp., 3.Kobe Univ., 4.Tohoku Univ.)
[23p-A301-9]Influence of magnetic field strength of magnetized RFEA on negative ion energy
distribution function measurements
〇Yoshinobu Matsuda1, Yosuke Kanahori1, Seiichi Hayakawa1, Tamiko Oshima1 (1.Nagasaki Univ.)
[23p-A301-10]Negative ion emission from sputtering targets: Al-doped ZnO vs. copper
〇Yoshinobu Matsuda1, Seiichi Hayakawa1, Yosuke Kanahori1, Tamiko Oshima1 (1.Nagasaki Univ.)
[23p-A301-11]Influence of magnet position on array-shaped RF magnetron sputtering source based on a combination of race-track and segment magnetron plasmas
〇(M2)Ryunosuke Masunaga1, Yasunori Ohtsu1 (1.Saga Univ.)
[23p-A301-12]Influence of magnet arrangement on RF ring-shaped hollow magnetized plasma production using two facing cylindrical targets
〇Bunta Kondo1, Yasunori Ohtsu1 (1.Saga Univ.)
[23p-A301-13]Measurement of spatial distribution of RF magnetron plasmausing fluorocarbon polymer targetfor preparing hydrophobic films.
〇Ryohei Kuno1, Yasunori Ohtsu1, Takeshi Yasunaga2, Yasuyuki Ikegami2 (1.Saga Univ., 2.Saga Univ IOES.)
[23p-A301-14]Production of high-density hydrogen plasma by RF magnetized hollow-cathode discharge with permanent magnets and measurement of its spatial distribution
〇Takeshi Uchida1, Ohtsu Yasunori1 (1.Saga Univ.)