Presentation Information
[23p-A301-8]Analysis of optically-emitting delay times in deep oscillation magnetron sputtering by time-resolved optical emission spectroscopy
〇Eisuke Yokoyama1, Kaede Horiuchi1, Yusei Takahashi1, Yuki Nakagawa1, Nobuo Nishimiya1, Masaomi Sanekata1, Masahide Tona2, Hiroaki Yamamoto2, Keizo Tsukamoto2, Kiyokazu Fuke3, Keijiro Ohshimo4, Fuminori Misaizu4 (1.Tokyo Polytech. Univ., 2.Ayabo Corp., 3.Kobe Univ., 4.Tohoku Univ.)
Keywords:
deep oscillation magnetron sputtering,optical emission spectroscopy,gas rarefaction phenomenon
Deep oscillating magnetron sputtering (DOMS) controlled by periodic ON/OFF micropulse trains allows pulse-by-pulse analysis of plasma processes. In the present study, the gas rarefaction phenomenon, which is a problem in coating and deposition by high powered pulsed magnetron sputtering (HPPMS), was investigated temporally and spatially from the correlation between the delay time of atomic line emission and gas density using DOMS and plasma optical emission spectrometry (OES).
The DOMS was operated Ar gas (99.999%) under a working pressure of 0.63 ~ 0.86 Pa. A circular magnetron sputtering source equipped with a 2-inch titanium disk target was employed as the sputtering source. The sputtering source was powered by a high-power pulse generator. The DOMS waveform consisting of 25 micropulses with 8 ~ 12 μs pulse on-times and 50 μs pulse off-times, and the total length of the macropulse being 1500 μs was used.
The DOMS discharge current shows a typical comb-like waveform. In the time-resolved OES, the emissions of sputtered particles (Ti and Ti+) and gas particles (Ar) were observed with the time delay from each micropulse. The results on temporal and spatial analyses of the delay times of the Ar-atomic-line emission (750.38 nm) suggest a large optical-emission delay due to the heating and rarefaction of the Ar gas by the strong first pulse discharge. In addition, the pulse development of the delay time shows periodically increase and decrease. It is suggested that the periodic behavior corresponds to repeating rarefaction and refilling of Ar gas in the vicinity of the metal target.
The DOMS was operated Ar gas (99.999%) under a working pressure of 0.63 ~ 0.86 Pa. A circular magnetron sputtering source equipped with a 2-inch titanium disk target was employed as the sputtering source. The sputtering source was powered by a high-power pulse generator. The DOMS waveform consisting of 25 micropulses with 8 ~ 12 μs pulse on-times and 50 μs pulse off-times, and the total length of the macropulse being 1500 μs was used.
The DOMS discharge current shows a typical comb-like waveform. In the time-resolved OES, the emissions of sputtered particles (Ti and Ti+) and gas particles (Ar) were observed with the time delay from each micropulse. The results on temporal and spatial analyses of the delay times of the Ar-atomic-line emission (750.38 nm) suggest a large optical-emission delay due to the heating and rarefaction of the Ar gas by the strong first pulse discharge. In addition, the pulse development of the delay time shows periodically increase and decrease. It is suggested that the periodic behavior corresponds to repeating rarefaction and refilling of Ar gas in the vicinity of the metal target.