[23p-A303-1~8] 13.3 Insulator technology

2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)

[23p-A303-5] Preparation and evaluation of GeO₂ film by two-step oxidation

〇Hajime Saito¹, Yuta Tsuchiya¹, Yoshitaka Iwazaki¹, Tomo Ueno¹ (1.TUAT)

Keywords:

semiconductor