[23p-A602-1~16] 15.5 Group IV crystals and alloys

3:15 PM - 3:30 PM JST(6:15 AM - 6:30 AM UTC)

[23p-A602-10] Study on in-situ Sb doping process in fabrication of strained Si/SiGe/Si(110) heterostructures

〇Taketo Kawamura¹, Kousuke Hara¹, Junji Ymanaka¹, Kiyokazu Nakagawa², Keisuke Arimoto¹ (1.Univ. of Yamanashi, 2.Tokyo City Univ.)

Keywords:

strained Si,Sb doping,SiGe