Presentation Information

[23p-A602-8]Fabrication and evaluation of strained SiGe/Ge on patterned Si(111)

〇Masaki Nagao1, Youya Wagatsuma1, Takahiro Inoue1, Odashima Ayaka1, Shibahara Yuka1, Yamada Michihiro2,3, Hamaya Kohei2,4,5, Sawano Kentarou1 (1.Tokyo City Univ, 2.CSRN, Osaka Univ., 3.JST-PRESTO, 4.OTRI, Osaka Univ., 5.GSES, Osaka Univ.)

Keywords:

silicon germanium,germanium,critical thickness