Session Details
[19p-P10-1~6]16 Amorphous and Microcrystalline Materials (Poster)
Thu. Sep 19, 2024 4:00 PM - 6:00 PM JST
Thu. Sep 19, 2024 7:00 AM - 9:00 AM UTC
Thu. Sep 19, 2024 7:00 AM - 9:00 AM UTC
P10 (Exhibition Hall A)
[19p-P10-1]Design of optical thin films for building-integrated photovoltaics using numerical calculations
〇(M2)Sou Kubota1,2, Seiya Watanabe1, Leo Adachi1,2, Zhihao Xu2, Sai Hitoshi2, Michio Kondo1,3, Hiroyuki Wada1 (1.Tokyo Inst. Tech, 2.AIST, 3.Waseda Univ)
[19p-P10-2]Improvement of semiconductor properties of MoOx films with N2 annealing prepared by ECR
〇Takuma Yoshida1, Futa Imai1, Yoji Saito2, Yasuyuki Kobayashi1, Ryosuke Watanabe1 (1.Hirosaki Univ., 2.Seikei Univ.)
[19p-P10-3]Evaluation of surface passivation properties of ECR sputter deposited MoOx-Si hetero-junction solar cells
〇Futa Imai1, Takuma Yoshida1, Yoji Saito2, Yasuyuki Kobayashi1, Ryosuke Watanabe1 (1.Hirosaki Univ., 2.Seikei Univ.)
[19p-P10-4]A study on Spin-coated TiO2-ZrO2 Antireflection Films onto Textured Si Solar Cells
Tomomi Sako1, 〇Yoji Saito1 (1.Seikei Univ.)
[19p-P10-5]Influence of passivation films grown by nitric acid oxidation on heterojunction silicon solar cells using molybdenum oxide
Akira Mitsuhashi1, Tomoya Suzuki1, 〇Ryosuke Watanabe2, Yoji Saito1 (1.Seikei Univ., 2.Hirosaki Univ.)
[19p-P10-6]Effects on intrinsic Si-Cl and water vapor on the devitrification of silica glass
〇Naohiro Horii1, Ryouko Inaba1, Yuuki Hashimoto1, Kuzuu Nobu2, Hideharu Horikoshi3 (1.Nat. Inst. of Tech. Fukui Col., 2.Univ. of Fukui, 3.Tosoh SGM)