[16p-P02-1~12]8.2 Plasma deposition of thin film, plasma etching and surface treatment
Mon. Sep 16, 2024 1:30 PM - 3:30 PM JST
Mon. Sep 16, 2024 4:30 AM - 6:30 AM UTC
Mon. Sep 16, 2024 4:30 AM - 6:30 AM UTC
P02 (Exhibition Hall A)
Sessions(by Category)
8 Plasma Electronics : 8.2 Plasma deposition of thin film, plasma etching and surface treatment
[18a-A31-1~11]8.2 Plasma deposition of thin film, plasma etching and surface treatment
Wed. Sep 18, 2024 9:00 AM - 12:00 PM JST
Wed. Sep 18, 2024 12:00 AM - 3:00 AM UTC
Wed. Sep 18, 2024 12:00 AM - 3:00 AM UTC
A31 (TOKI MESSE 3F)
Akihisa Ogino(Shizuoka Univ.)
[18p-A31-1~19]8.2 Plasma deposition of thin film, plasma etching and surface treatment
Wed. Sep 18, 2024 1:30 PM - 6:30 PM JST
Wed. Sep 18, 2024 4:30 AM - 9:30 AM UTC
Wed. Sep 18, 2024 4:30 AM - 9:30 AM UTC
A31 (TOKI MESSE 3F)
Haruka Suzuki(Nagoya Univ.), Masanaga Fukasawa(AIST)
3 results ( 1 - 3 )
- 1