Presentation Information
[22a-12N-1]Compensations of Distortions and-Light Intensity Distributions in the Optics for Stereophonic Lithography Using a Pair of Paraboloid Mirrors
〇Toshiyuki Horiuchi1, Jun-ya Iwasaki1, Hiroshi Kobayashi1 (1.Tokyo Denki Univ.)
Keywords:
stereophonic projection lithography,parabolic mirror,field distortion
Lithography for printing rough patterns with widths of 50-500 µm on arbitrarily curved surfaces has been researched and developed using a pair of parabolic mirrors. However, it was found that positions of projected patterns were shifted, and exposure-field shapes were distorted considerably. In addition, caused by the distortions, light intensity was distributed in the exposure field. For this reason, compensations of field distortions and improvements of exposure homogeneity were implemented here. The field distortions were calculated and compared with actual ones, and it was clarified that the calculation results coincided with the actual distortion. For this reason, reticle pattern shapes were modified as the shape was projected on a wafer in square lattices. Moreover, distributions of illumination light were corrected so as printed patterns were printed as homogeneously as possible in the fields. Prospects for the compensations of distortions and improvements of exposure homogeneity are good.