Session Details
[22a-12N-1~10]7.3 Micro/Nano patterning and fabrication
Fri. Mar 22, 2024 9:00 AM - 11:45 AM JST
Fri. Mar 22, 2024 12:00 AM - 2:45 AM UTC
Fri. Mar 22, 2024 12:00 AM - 2:45 AM UTC
12N (Building No. 1)
Jiro Yamamoto(Hitachi), Jun Taniguchi(Tokyo Univ. of Sci.)
[22a-12N-1]Compensations of Distortions and-Light Intensity Distributions in the Optics for Stereophonic Lithography Using a Pair of Paraboloid Mirrors
〇Toshiyuki Horiuchi1, Jun-ya Iwasaki1, Hiroshi Kobayashi1 (1.Tokyo Denki Univ.)
[22a-12N-2]Pattern formation by 3-Dimensional photolithography using built-in lens mask
Toshiaki Toshiaki1, Masaaki Masaaki1, Masaru Sasago1, 〇Yoshihiko Hirai1 (1.Osaka Metropolitan Univ.)
[22a-12N-3]Hybrid simulation of stochastic method and molecular dynamics of electron beam lithography for chemically amplified resists (2)
〇Hiroto Wakamatsu1, Daiki Nakamura1, Masaaki Yasuda1 (1.Osaka Met. Univ.)
[22a-12N-4]Development of Chemically Amplified Resist Assisted by Deep Learning
〇Chen Tang1, Tanaka Toshiaki2, Sekiguchi Atsushi2, Hirai Yoshihiko2, Yasuda Masaaki2 (1.Osaka Pref. Univ., 2.Osaka Metropolitan Univ.)
[22a-12N-5]Formation of Silicone Microcapsule Array Structures Encapsulating Ionic Liquids
〇Masayuki Okoshi1, Kaede Iwasaki1 (1.NDA)
[22a-12N-6]Repeated imprint using replica mold in UV nanoimprint process and fabrication of replica mold aiming for large area imprint
〇Risa Tanaka1, Ohsaki Takeshi1, Jun Taniguchi2 (1.Toyo Gosei, 2.Tokyo Univ. of Sci.)
[22a-12N-7]Investigation of transfer pattern profiles in thermal nanoimprint process
〇Hiroaki Kawata1, Rina Tsunetou1, Yoshihiko Hirai1, Hisao Kikuta1 (1.Osaka Metro. Univ.)
[22a-12N-8]Study on mold release process for tilted diffraction gratings for AR/VR Glasses using nanoimprinting
Yusei Kunitou1, Masaaki Yasuda1, 〇Yoshihiko Hirai1 (1.Osaka Metropolitan. Univ.)
[22a-12N-9]Single-digit-nanometer measurement accuracy of thickness of transformed thin films to fluorescence intensity (2): Homology or similarity effect of polymerizable functional groups between monomer and adhesive agent in UV nanoimprinting
〇Ryota Inagawa1, Akiko Onuma1, Hiromasa Niinomi1, Tomoya Oshikiri1, Masaru Nakagawa1 (1.IMRAM, Tohoku Univ.)
[22a-12N-10]Periodicity control of trimming-induced wrinkled structures by adding cross-linker to UV-nanoimprint resist
〇Naoki Takano1, Hiromasa Niinomi1, Masaru Nakagawa1 (1.IMRAM, Tohoku Univ.)