[22a-12N-1~10] 7.3 Micro/Nano patterning and fabrication

9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)

[22a-12N-2] Pattern formation by 3-Dimensional photolithography using built-in lens mask

Toshiaki Toshiaki¹, Masaaki Masaaki¹, Masaru Sasago¹, 〇Yoshihiko Hirai¹ (1.Osaka Metropolitan Univ.)

Keywords:

3 dimensional lithography,single shot exposure,sticking

Built-in lens masks (BILMs), which emulates wavefronts in space with arbitrary 3-Dimensional intensity distributions, enable multiple focus functions through a simple batch exposure using a single mask, which can be used to form three-dimensional images. The effectiveness of BILM has been verified by Computational Lithography (CL). In this report, an experimental verification was reported.