Presentation Information
[22a-12N-3]Hybrid simulation of stochastic method and molecular dynamics of electron beam lithography for chemically amplified resists (2)
〇Hiroto Wakamatsu1, Daiki Nakamura1, Masaaki Yasuda1 (1.Osaka Met. Univ.)
Keywords:
electron beam lithography,chemically amplified resist,simulation
We develop a hybrid simulation that combines stochastic methods and molecular dynamics methods for electron beam lithography of negative-type chemically amplified resists. In this study, we have improved the method by alternately using both methods to repeat the cross-linking reaction and structural relaxation, allowing for a more accurate analysis of the structural changes in the resist.