[22a-61C-1~9] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)

[22a-61C-8] Fabrication of minimal Open PDK and Application to OPamp

〇Takeshi Hamamoto¹, Shingo Ura², Seijiro Moriyama³, Hiroshi Tanimoto⁴, Tadaaki Tsuchiya², Shiro Hara^5,6 (1.MINIMAL, 2.Logic Research, 3.Anagix, 4.KITAMI Inst. of Tech., 5.AIST, 6.Hundred)

Keywords:

SOI,MOSFET,PDK

Minimal fab is a production system that targets high-mix, low-volume production. Device adaptation results at this minimal fab include prototype production of MEMS devices such as cantilevers, CMOS, and Ring Oscillators and operational amplifiers using them. The operation verification of the 1,000 Gate level integrated circuit has already been completed and it is now in the prototype fab stage. In the future, we will build a PDK (Process Design Kit) and focus on improving MOSFET operation accuracy and ensuring process robustness in order to support circuit operations based on a wide range of user designs. On November 1st, we released minimal Open PDK. In this presentation, we will provide an overview of this and report on the OPamp that we designed and prototyped using these materials.