The 71st JSAP Spring Meeting 2024
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Session Details

Oral presentation13 Semiconductors : 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[22a-61C-1~9]13.4 Si processing /Si based thin film / MEMS / Equipment technology

Fri. Mar 22, 2024 9:00 AM - 11:30 AM JST
Fri. Mar 22, 2024 12:00 AM - 2:30 AM UTC
61C (Building No. 6)
Masato Sone(Tokyo Tech), Reo Kometani(Univ. of Tokyo)
9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)

[22a-61C-1]Optimal rinsing method in spin droplet cleaning technology

〇Kazumasa Nemoto1, Takashi Yajima2, Noriko Miura2, Kazushige Sato2, Shiro Hara1,2,3 (1.AIST, 2.Minimal Fab, 3.Hundred)
9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)

[22a-61C-2]Drying tool of wafer cleaning process in wafer manufacturing for Minimal Fab Ⅱ

〇Takashi Yajima1, Tatsuya Fujita3, Kazumasa Nemoto2, Fumito Imura3, Shiro Hara1,2,3 (1.MINIMAL, 2.AIST, 3.Hundred)
9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)

[22a-61C-3]Development of Minimal Fab HfNx Reactive Sputtering Tool

〇Shuichi Noda1, Yuuki Yabuta3, Naoko Yamamoto3, Ryuichiro Kamei3, Shiro Hara1,2 (1.AIST, 2.MINIMAL, 3.Seinan-kogyo)
9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[22a-61C-4]Development and Characterization of Minimal Metal Etching Process

〇Hiroyuki Tanaka1, Yoshiyuki Nozawa2, Toshihiro Hayami2, Shiro Hara1,3 (1.AIST, 2.SPPT, 3.MINIMAL)
10:15 AM - 10:30 AM JST(1:15 AM - 1:30 AM UTC)

[22a-61C-5]Development of Plasma TEOS Film Deposited at Low Temperature for Minimal TSV Process

〇Noriko Miura1, Hiroyuki Tanaka2, Fumito Imura3, Yoshiyuki Nozawa4, Toshiyasu Hayami4, Shiro Hara1,2,3 (1.MINIMAL, 2.AIST, 3.Hundred, 4.SPPT)
10:30 AM - 10:45 AM JST(1:30 AM - 1:45 AM UTC)

[22a-61C-6]Development of Minimal Fab laser heating tool for low-temperature processing at 300 – 600 ℃(Ⅲ)

〇kazushige sato1,2, Takashi Chiba1,2, Masao Terada1,2, Kengo Hamada1,2, Shiro Hara1,3 (1.MINIMAL, 2.SAKAGUCHI ELECTRIC HEATERS, 3.AIST)
10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)

[22a-61C-7]Improvement of wafer in-plane variation of device processes in Minimal Fab

〇Hiroyoshi Hongoh1, Shuhei Nakamichi1, Shiro Hara1,2,3 (1.MINIMAL, 2.AIST, 3.Hundred)
11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)

[22a-61C-8]Fabrication of minimal Open PDK and Application to OPamp

〇Takeshi Hamamoto1, Shingo Ura2, Seijiro Moriyama3, Hiroshi Tanimoto4, Tadaaki Tsuchiya2, Shiro Hara5,6 (1.MINIMAL, 2.Logic Research, 3.Anagix, 4.KITAMI Inst. of Tech., 5.AIST, 6.Hundred)
11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)

[22a-61C-9]An influence of silicon-carbon bond on B-C-Si CVD film formation process

Mana Otani1, Mitsuko Muroi1, 〇Hitoshi Habuka1 (1.Yokohama Nat. Univ.)
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