[22p-12G-1~11] 8.1 Plasma production and diagnostics

2:15 PM - 2:45 PM JST(5:15 AM - 5:45 AM UTC)

[22p-12G-1] [The 45th Paper Award Speech] Angular distribution measurement of high-energy particles incident on an RF electrode in a dual-frequency capacitively-coupled plasma

Keita Ichikawa¹, Manh Hung Chu¹, Makoto Moriyama¹, Haruka Suzuki^1,2, Daiki Iino³, Hiroyuki Fukumizu³, Kazuaki Kurihara³, 〇Hirotaka Toyoda^1,2 (1.Nagoya Univ., 2.Nagoya Univ. cLPS, 3.Kioxia Corp.)

Keywords:

angular distribution,reactive ion etching,high-energy particles

The angular distribution of energetic particles incident on a substrate from a plasma is one of the key parameters that determine etching accuracy in reactive ion etching. We have developed an original system for measuring the spread of particles passing through an orifice using a microchannel plate, and succeeded for the first time in the world in measuring the angular distribution of incident ions and charge-exchange fast neutral particles, which had not been clarified before.