Presentation Information
[22p-12J-2]Exploration of Elastic Properties and Atomistic Networks of Carbon-Incorporated Amorphous Silica Using a Universal Neural Network Potential
〇Hiroki Sakakima1, Keigo Ogawa1, Sakurako Miyazaki1, Satoshi Izumi1 (1.Univ. of Tokyo)
Keywords:
silicon oxide,Carbon inclusion,Universal interatomic potential
The progressive miniaturization and integration in semiconductor devices have increased the internal stress of composing thin films, which raises the problem of mechanical reliability. Therefore, enhancing the mechanical strength of thin films composing a semiconductor device is crucial to further realizing their integration. We particularly focus on the reinforcement of silicon oxide dielectric films by incorporating carbon atoms. Utilizing molecular dynamics simulations with a universal neural network interatomic potential, we have systematically investigated the relationship between atomic network structure and mechanical properties under different compositions.