[23a-12K-1~8] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[23a-12K-8] Refined Measurement of the Contact Resistance of Thermoelectric Semiconductors with Advanced Transmittance Line Model

〇Akihiro Katsura¹, Maki Tsurumoto¹, Yukiko Hirose¹, Takashi Sato², Eiji Iwase², Tohru Sugahara¹ (1.Kyoto Institute Univ., 2.Waseda Univ.)

Keywords:

Transmittance Line Model Method