Session Details

[23a-12K-1~8]13.4 Si processing /Si based thin film / MEMS / Equipment technology

Sat. Mar 23, 2024 9:00 AM - 11:15 AM JST
Sat. Mar 23, 2024 12:00 AM - 2:15 AM UTC
12K (Building No. 1)
Masato Sone(Tokyo Tech), Yan Wu(Tokyo Inst. of Tech.)

[23a-12K-1]Evaluation of Relationship between Heat Treatment Temperature and Structural Stability of Micro-cantilevers Possessing Ti/Au Multi-layered Structures

〇(M1)Ryosuke Miyai1, Tomoyuki Kurioka1, Chun-Yi Chen1, Tso-Fu Mark Chang1, Katsuyuki Machida1, Hiroyuki Ito1, Yoshihiro Miyake1, Masato Sone1 (1.Tokyo Tech)

[23a-12K-2]Evaluation of the Effects of Heat Treatment Temperature on Warpage Deformation of the Ti/Au Multi-layered Electrodeposited-Au Proof Mass

〇(B)Tatsuhiko Mori1, Tomoyuki Kurioka1, Chun-Yi Chen1, Tso-Fu Mark Chang1, Katsuyuki Machida1, Hiroyuki Ito1, Yoshihiro Miyake1, Masato Sone1 (1.Tokyo Tech)

[23a-12K-3]Investigation of strain rate dependence by micro-compression testing of electrodeposited gold for MEMS accelerometer applications

〇(M1)Shota Kanno1, Taro Omura1, Tomoyuki Kurioka1, Chun-Yi Chen1, Katsuyuki Machida1, Hiroyuki Ito1, Yukihiro Miyake1, Tso-Fu Mark Chang1, Masato sone1 (1.Tokyo Tech)

[23a-12K-4]Electroless Ni-P Plating of the 3D Printed Matters from the Liquid Resin Containing Organometallic Catalysta

〇(M1)Shinsuke Takahata1, Po-wei Cheng1, Chun-Yi Chen1, Tomoyuki Kurioka1, Masato Sone1, Tso-fu Mark Chang1 (1.Tokyo tech)

[23a-12K-5]Response Characteristics of Humidity Sensor Using Cellulose Nanofiber

〇Mutsuto Katoh1,2, Toru Yahagi1, Naoya Yamada1, Shuji Tanaka2 (1.Yamagata RIT, 2.Tohoku Univ.)

[23a-12K-6]MEMS Electrostatic Actuator Controlling the Inter-layer Angle of Stacked 2D Materials

〇Kosuke Chikamatsu1, Manabu Ataka1, Momoko Onodera1, Tomoki Machida1, Hiroshi Toshiyoshi1 (1.IIS, Univ. of Tokyo)

[23a-12K-7]Evaluation of Electrical Resistance of Ultrathick Low-Stress LPCVD Poly-Si Film for MEMS Devices

〇Gen Shikida1, Hideharu Itatani1, Shuntaro Machida1, Yukio Suzuki2, Shuji Tanaka2, Manabu Izumi1 (1.KOKUSAI ELECTRIC CORPORATION, 2.TOHOKU Univ.)

[23a-12K-8]Refined Measurement of the Contact Resistance of Thermoelectric Semiconductors with Advanced Transmittance Line Model

〇Akihiro Katsura1, Maki Tsurumoto1, Yukiko Hirose1, Takashi Sato2, Eiji Iwase2, Tohru Sugahara1 (1.Kyoto Institute Univ., 2.Waseda Univ.)