Presentation Information
[23a-21C-2]Proposal of reverse-tapered etching for selectively-area grown crystals for the formation of GaN positive-bevel edge terminations
〇Takayoshi Oshima1, Masataka Imura1, Yuichi Oshima1, Toshiyuki Oishi2 (1.NIMS, 2.Saga Univ.)
Keywords:
GaN,reverse taper