Presentation Information
[23a-21C-3]Demonstration of AlN-Based Vertical p-n Diodes with Distributed Polarization Doping
〇Takeru Kumabe1, Akira Yoshikawa2,3, Seiya Kawasaki1, Maki Kushimoto1, Yoshio Honda3,4,5, Manabu Arai3, Jun Suda1,3, Hiroshi Amano3,4,5 (1.Grad. Sch. Eng. Nagoya Univ., 2.Asahi Kasei Corp., 3.IMaSS Nagoya Univ., 4.D Center Nagoya Univ., 5.IAR Nagoya Univ.)
Keywords:
Aluminum nitride,p-n diodes,Polarization engineering
AlN and high-Al-content AlGaN are garnering significant attention as materials for next-generation electronic devices. While the p-n junction is a fundamental component of semiconductor devices, AlN-based p-n diodes have not yet exhibited ideal electrical properties, primarily due to challenges in controlling conductivity through conventional impurity doping. In this study, we demonstrated near-ideal AlN-based vertical p-n diodes without any dopant. The polarization effects inherent in nitride semiconductors are engineered to control fixed charges and the built-in potential within the p-n junction.