Presentation Information
[23a-P07-17]Formation method and evaluation of silicone-modified SiO2 film on polycarbonate using LED with wavelength of 265 nm
〇Hidetoshi Nojiri1, Kazufumi Iwai1, Ryosuke Yoshii2 (1.RENIAS, 2.Shin-Etsu Chemical)
Keywords:
Silicone,265 nm LED,Photochemical modification
Modification of silicone resin film formed on polycarbonate (PC) to highly abrasion-resistant SiO2 by irradiating with a 265 nm wavelength LED was investigated. SiO2 modified layer was obtained by adjusting the amount of UV absorber added to increase the absorption of ultraviolet light, and by irradiation in an ozone atmosphere to promote the modification reaction effectively. After light irradiation, surface hardness by nano-indentation method and Taber abrasion at 1000 cycle (delta haze ΔH1000) were measured. As a result, surface hardness was improved to more than 2 GPa at depth under 50 nm and abrasion resistance ΔH1000 was also improved from 15% (no-irradiation) to under 3% (irradiation).